Chiudi

Aggiungi l'articolo in

Chiudi
Aggiunto

L’articolo è stato aggiunto alla lista dei desideri

Chiudi

Crea nuova lista

Plasma Electronics: Applications in Microelectronic Device Fabrication - Toshiaki Makabe,Zoran Lj. Petrovic - cover
Plasma Electronics: Applications in Microelectronic Device Fabrication - Toshiaki Makabe,Zoran Lj. Petrovic - cover
Dati e Statistiche
Wishlist Salvato in 0 liste dei desideri
Plasma Electronics: Applications in Microelectronic Device Fabrication
Disponibile in 5 giorni lavorativi
225,62 €
-5% 237,50 €
225,62 € 237,50 € -5%
Disp. in 5 gg lavorativi
Chiudi
Altri venditori
Prezzo e spese di spedizione
ibs
225,62 € Spedizione gratuita
disponibile in 5 giorni lavorativi disponibile in 5 giorni lavorativi
Info
Nuovo
Altri venditori
Prezzo e spese di spedizione
ibs
225,62 € Spedizione gratuita
disponibile in 5 giorni lavorativi disponibile in 5 giorni lavorativi
Info
Nuovo
Altri venditori
Prezzo e spese di spedizione
Chiudi

Tutti i formati ed edizioni

Chiudi
Plasma Electronics: Applications in Microelectronic Device Fabrication - Toshiaki Makabe,Zoran Lj. Petrovic - cover
Chiudi

Promo attive (0)

Descrizione


Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Leggi di più Leggi di meno

Dettagli

2014
Hardback
412 p.
Testo in English
234 x 156 mm
725 gr.
9781482222050
Chiudi
Aggiunto

L'articolo è stato aggiunto al carrello

Chiudi

Aggiungi l'articolo in

Chiudi
Aggiunto

L’articolo è stato aggiunto alla lista dei desideri

Chiudi

Crea nuova lista

Chiudi

Chiudi

Siamo spiacenti si è verificato un errore imprevisto, la preghiamo di riprovare.

Chiudi

Verrai avvisato via email sulle novità di Nome Autore