Directed Self-assembly of Block Co-polymers for Nano-manufacturing

Roel Gronheid (Curatore)

Paul Nealey (Curatore)

Elsevier Science & Technology, 2015

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

• Curatore: Roel Gronheid, Paul Nealey
• Editore: Elsevier Science & Technology
• Collana: Woodhead Publishing Series in Electronic and Optical Materials
• Anno: 2015
• Rilegatura: Hardback
• Pagine: 328 p.
• Dimensioni: 229 x 152 mm
• Peso: 660 gr.
• EAN: 9780081002506

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